Tetramethylammonium hydroxide solution (25 wt. % solution in water) may be used as a base for pH adjustment to obtain hexagonal mesoporous aluminophosphate (TAP). Tetramethylammonium hydroxide is a quaternary ammonium salt generally used as an anisotropic etchant for silicon due to its high silicon etching rate.
One of the industrial uses of TMAH is for the anisotropic etching of silicon. It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist.
TMAH solution is widely used in the electronics industry as a developer or cleaner. TMAH is typically one of several ingredients in etching / stripping mixtures, although it may also be used as a pure chemical. It is often used in solution in water, and less frequently, in methanol.
KOH and TMAH are anisotropic silicon etches, used to make V-grooves, membranes, and holes through wafers, as well as other devices. ... KOH is simply the hydroxide of potassium. TMAH is a organic hydroxide and stands for Tetramethyl ammonium hydroxide.
